Fabrication and measurement of high-g MEMS accelerometer Fabrication and measurement of high-g MEMS accelerometer

Fabrication and measurement of high-g MEMS accelerometer

  • 期刊名字:仪器仪表学报
  • 文件大小:
  • 论文作者:Shi Yunbo,Liu Jun,Qi Xiaojin,M
  • 作者单位:National Key Lab for Electronic Measurement and Technology,Department of Mechanical Engineering
  • 更新时间:2022-11-24
  • 下载次数:
论文简介

A high-g beam-mass structure accelerometer was designed. In this structure, by means of KOH back etching on the mass, V-groove structure was fabricated on the backside of the mass, so the weight of the mass and also the relative distance between the mass center and the neutral plane were all decreased. With the thin mass structure, we can take advantage of both beam-mass structure and flat film structure ; the fabrication process is also simple. By means of Hopkinson shock test system, we did the accelerometer calibration. According to the test result,the sensitivity of the MEMS accelerometer is 0.71 μV/g, which keeps in accordance with the theoretical calculation. After a 200 000 g shocking test, the micro structure worked as usual, so this design can satisfy the requirements of high shock, seriously vibration test environment.

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