Process and properties of electroless Ni-W-B amorphous electrical resistance film Process and properties of electroless Ni-W-B amorphous electrical resistance film

Process and properties of electroless Ni-W-B amorphous electrical resistance film

  • 期刊名字:中国有色金属学会会刊(英文版)
  • 文件大小:
  • 论文作者:ZHU Xiao-yun,GUO Zhong-cheng,X
  • 作者单位:The Centre of New Materials and Surface Engineering Research and Development
  • 更新时间:2023-02-08
  • 下载次数:
论文简介

The process and properties of electroless plating Ni-W-B alloy have been studied. The results show that the deposits containing W and B are obtained, and the deposition rate of the bath is increased with increase of W content when a certain amount of sodium tungstate solution is added in the Ni-B bath. The Ni-W-B alloy is amorphous as deposition and its resistivity increases directly with the increase of W content in the coating, but decreases gradually with increasing the deposit thickness. XRD and SEM show that the distributions of W and B in the Ni-W-B alloy film are very uniform and dispersed without any segregation.

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