Dynamic simulation on the preparation process of thin films by pulsed laser

An ablation model of targets irradiated by pulsed laser is established. By using the simple energy balance conditions, the relationship between ablation surface location and time is derived. By an adiabatic approximation, the continuous-temperature condition, energy conservation and all boundany conditions can be established. By applying the analytical method and integral-approximation method, the solid and liquid phase temperature distributions are obtained and found to be a function of time and location. The interface of solid and liquid phase is also derived. The results are compared with the other published data. In addition, the dynamics process of pulsed laser deposition of KTN (Kta0.65Nb0.35O3) thin film is simulated in detail by using fluid dynamics theory. By combining the expression of the target ablation ratio and the dynamic equation and by using the experimental data, the effects of laser action parameters on the thickness distribution of thin film and on the thin film component characteristics are discussed. The results are in good agreement with the experimental data.